Plasmonic field and efficiency enhancement in crystalline thin film photovoltaics

Deyin Zhao; Zhenqiang Ma; Weidong Zhou

doi:10.1117/12.861887

24 August 2010 Plasmonic field and efficiency enhancement in crystalline thin film photovoltaics

Deyin Zhao, Zhenqiang Ma, Weidong Zhou

Proceedings Volume 7772, Next Generation (Nano) Photonic and Cell Technologies for Solar Energy Conversion; 777215 (2010) https://doi.org/10.1117/12.861887
Event: SPIE Solar Energy + Technology, 2010, San Diego, California, United States

Abstract

We report the design and optimization of plasmonic thin film photovoltaics (TFPV) based on single crystalline Si nanomembranes, transferred onto ITO/plastic solar cells. Due to the presence of Fabry-Perot (FP) interferences, both near and far field plasmonic field enhancements are modulated by thin film thicknesses. The placement of absorption region (junction location and/or quantum well location) is critical in TFPV efficiency improvement. For TFPV thin film thickness between 200-500 nm, we obtained field enhancement up to 100%, and cell efficiency improvement up to 35%, assuming the standard test one sun AM1.5 radiation conditions. The efficiency enhancement for 200 nm silver particles decreases rapidly with the increase of thin film thicknesses, while we observed less change in cell efficiency enhancement for smaller 100 nm silver particles. Additionally, we observed a relatively large process tolerance window for the size, shape, and placement of Ag nanoparticles, formed by the annealing of ultra-thin Ag thin films.

Citation Download Citation

Deyin Zhao, Zhenqiang Ma, and Weidong Zhou "Plasmonic field and efficiency enhancement in crystalline thin film photovoltaics", Proc. SPIE 7772, Next Generation (Nano) Photonic and Cell Technologies for Solar Energy Conversion, 777215 (24 August 2010); https://doi.org/10.1117/12.861887

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