A simple null-field ellipsometric imaging system (NEIS) for in-situ monitoring of EUV-induced deposition on EUV optics

Rashi Garg; Nadir Faradzhev; Shannon Hill; Lee Richter; P. S. Shaw; R. Vest; T. B. Lucatorto

doi:10.1117/12.855967

22 March 2010 A simple null-field ellipsometric imaging system (NEIS) for in-situ monitoring of EUV-induced deposition on EUV optics

Rashi Garg, Nadir Faradzhev, Shannon Hill, Lee Richter, P. S. Shaw, R. Vest, T. B. Lucatorto

Author Affiliations +

Proceedings Volume 7636, Extreme Ultraviolet (EUV) Lithography; 76361Z (2010) https://doi.org/10.1117/12.855967
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

We describe a null-field ellipsometric imaging system (NEIS) that provides for the real-time imaging of carbon deposition profiles on extreme-ultraviolet (EUV) optics in a vacuum system. NEIS has been demonstrated at NIST on a small chamber that is used for EUV optics lifetime testing. The system provides images of carbon deposition spots with sub-nanometer resolution thickness measurements that maintain good agreement with those from ex-situ spectral ellipsometry (SE) and x-ray photoelectron spectroscopy (XPS). The system will be implemented on several synchrotron beamlines for real-time monitoring of carbon film growth on optics during EUV irradiation.

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Rashi Garg, Nadir Faradzhev, Shannon Hill, Lee Richter, P. S. Shaw, R. Vest, and T. B. Lucatorto "A simple null-field ellipsometric imaging system (NEIS) for in-situ monitoring of EUV-induced deposition on EUV optics", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76361Z (22 March 2010); https://doi.org/10.1117/12.855967

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