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Proceedings Article

Advances in DMD-based UV application reliability below 320nm

[+] Author Affiliations
Jonathan T. Fong, Tom W. Winter, S. Josh Jacobs

Texas Instruments Inc. (USA)

Proc. SPIE 7637, Alternative Lithographic Technologies II, 763718 (April 01, 2010); doi:10.1117/12.848461
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From Conference Volume 7637

  • Alternative Lithographic Technologies II
  • Daniel J. C. Herr
  • San Jose, California | February 21, 2010

abstract

Texas Instrument's spatial light modulator chip, the DMD (digital micromirror device, the central chip in all DLP based systems) has been used in multiple maskless lithography applications for the past 5-7 years. Typically these applications have been focused on PCB lithography. Applications using illumination below 320nm have not been feasible due to shortened lifetime of the device at shorter wavelengths. Recent advances in DMD processing have made significant improvements in the operational lifetime of the DMD. This paper will cover the background of UV-A DMD maskless lithography and demonstrate the increased lifetime at 311nm and 266nm with the new processes.

© (2010) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Jonathan T. Fong ; Tom W. Winter and S. Josh Jacobs
"Advances in DMD-based UV application reliability below 320nm", Proc. SPIE 7637, Alternative Lithographic Technologies II, 763718 (April 01, 2010); doi:10.1117/12.848461; http://dx.doi.org/10.1117/12.848461


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