High contact angle fluorosulfonamide-based materials for immersion lithography

Daniel P. Sanders; Linda K. Sundberg; Masaki Fujiwara; Yoshiharu Terui; Manabu Yasumoto

doi:10.1117/12.847257

30 March 2010 High contact angle fluorosulfonamide-based materials for immersion lithography

Daniel P. Sanders, Linda K. Sundberg, Masaki Fujiwara, Yoshiharu Terui, Manabu Yasumoto

Proceedings Volume 7639, Advances in Resist Materials and Processing Technology XXVII; 763925 (2010) https://doi.org/10.1117/12.847257
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Fluoroalcohol-containing materials have found considerable use in 193 nm immersion topcoat and topcoat-free immersion resist materials due to their good water contact angles and base-dissolution properties. Trifluoromethanesulfonamide-containing materials are another alternative which have been explored for use in 193 nm photoresist and immersion topcoat applications; however, fluorosulfonamide materials have suffered from issues such as low water contact angles. In this paper, we report the synthesis of a series of fluorosulfonamide-containing methacrylate materials with water contact angle and base dissolution performance that rivals or exceeds that of comparable fluoroalcohol-based materials.

Citation Download Citation

Daniel P. Sanders, Linda K. Sundberg, Masaki Fujiwara, Yoshiharu Terui, and Manabu Yasumoto "High contact angle fluorosulfonamide-based materials for immersion lithography", Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 763925 (30 March 2010); https://doi.org/10.1117/12.847257

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