In double-patterning technology (DPT), we study the complex interactions of layout creation, physical design and design rule checking flows for the 22nm and 16nm device nodes. Decomposition includes the cutting (splitting) of original design-intent features into new overlapping polygons where required; and the coloring of all the resulting polygons into two mask layouts. We discuss the advantages of geometric distribution for polygon operations with the limited range of influence. Further, we find that even the naturally global coloring step can be handled in a geometrically local manner. We analyze and compare the latest methods for designing, processing and verifying DPT methods including the 22nm and 16nm nodes.© (2010) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.