Design and performance of capping layers for EUV multilayer mirrors

Sasa Bajt; Henry N Chapman; Nhan Nguyen; Jennifer B. Alameda; Jeffrey C. Robinson; Michael E. Malinowski; Eric Gullikson; Andy Aquila; Charles Tarrio; Steven Grantham

doi:10.1117/12.484966

16 June 2003 Design and performance of capping layers for EUV multilayer mirrors

Sasa Bajt, Henry N Chapman, Nhan Nguyen, Jennifer B. Alameda, Jeffrey C. Robinson, Michael E. Malinowski, Eric Gullikson, Andy Aquila, Charles Tarrio, Steven Grantham

Author Affiliations +

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.484966
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

The reflectance stability of multilayer coatings for extreme ultraviolet lithography (EUVL) in a commercial tool environment is of utmost importance to ensure continuous exposures with minimum maintenance cost. We have made substantial progress in designing the protective capping layer coatings, understanding their performance and estimating their lifetimes based on accelerated electron beam and EUV exposure studies. Our current capping layer coatings have about 40 times longer lifetimes than Si-capped multilayer optics. Nevertheless, the lifetime of current Ru-capped multilayers is too short to satisfy commercial tool requirements and further improvements are essential.

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Sasa Bajt, Henry N Chapman, Nhan Nguyen, Jennifer B. Alameda, Jeffrey C. Robinson, Michael E. Malinowski, Eric Gullikson, Andy Aquila, Charles Tarrio, and Steven Grantham "Design and performance of capping layers for EUV multilayer mirrors", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.484966

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