Evolution of illumination systems in microlithography: a retrospective

Alois M. Herkommer

doi:10.1117/12.870738

8 September 2010 Evolution of illumination systems in microlithography: a retrospective

Alois M. Herkommer

Proceedings Volume 7652, International Optical Design Conference 2010; 76520X (2010) https://doi.org/10.1117/12.870738
Event: International Optical Design Conference 2010, 2010, Jackson Hole, WY, United States

Abstract

Illumination systems in microlithography have evolved from simple light mixing devices towards ultra-flexible contrast enhancement tools, enabling today's most advanced lithographic processes. A survey of the changing illumination requirements, design concepts and functionality is given.

Citation Download Citation

Alois M. Herkommer "Evolution of illumination systems in microlithography: a retrospective", Proc. SPIE 7652, International Optical Design Conference 2010, 76520X (8 September 2010); https://doi.org/10.1117/12.870738

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available