Spectroscopic ellipsometry for lithography front-end level CD control: a complete analysis for production integration

David Herisson; DaniEle Neira; Cyril Fernand; Philippe Thony; Daniel Henry; Stephanie Kremer; Marco Polli; Marco Guevremont; Assim Elazami

doi:10.1117/12.485031

2 June 2003 Spectroscopic ellipsometry for lithography front-end level CD control: a complete analysis for production integration

David Herisson, DaniEle Neira, Cyril Fernand, Philippe Thony, Daniel Henry, Stephanie Kremer, Marco Polli, Marco Guevremont, Assim Elazami

Author Affiliations +

Proceedings Volume 5038, Metrology, Inspection, and Process Control for Microlithography XVII; (2003) https://doi.org/10.1117/12.485031
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Using scatterometry based on Spectroscopic Ellipsometry, a complete study of Gate lithography level measurement on standard products has been conducted. Experiments were done on typical ST batches for 120, 90, and 65 nm nodes. KLA-Tencor SpectraCD SE system is used to collect and analyze line critical dimensions and profiles. A systematic correlation with Scanning Electron Microscope (SEM) is done, completed by a cross section analysis. The study also takes into account lithography defect anlysis using a specific targets with intentionally generated process failures. Our objective is to determine the sensitivity window of such measurment technique to process defect and marginal process conditions. We show that KLA-Tencor SpectraCD allows a full reconstruction of the line profile - as well as the film stack underneath it - with values that are in agreement with production control. Cpm values obtained on products demonstrate that SE based scatterometry fulfils all requirements to be integrated in a production envrionemnt and provides suitable metrology for advanced lithography process monitoring.

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David Herisson, DaniEle Neira, Cyril Fernand, Philippe Thony, Daniel Henry, Stephanie Kremer, Marco Polli, Marco Guevremont, and Assim Elazami "Spectroscopic ellipsometry for lithography front-end level CD control: a complete analysis for production integration", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); https://doi.org/10.1117/12.485031

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