Full Content is available to subscribers

Subscribe/Learn More  >
Proceedings Article

Spectroscopic ellipsometry for lithography front-end level CD control: a complete analysis for production integration

[+] Author Affiliations
David Herisson, DaniEle Neira, Cyril Fernand

STMicroelectronics Crolles France (France)

Philippe Thony

CEA Leti (France)

Daniel Henry

STMicroelectronics (France)

Stephanie Kremer, Marco Polli, Marco Guevremont, Assim Elazami

KLA-Tencor Corp. (USA)

Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, 264 (May 27, 2003); doi:10.1117/12.485031
Text Size: A A A
From Conference Volume 5038

  • Metrology, Inspection, and Process Control for Microlithography XVII
  • Daniel J. Herr
  • Santa Clara, CA | February 23, 2003

abstract

Using scatterometry based on Spectroscopic Ellipsometry, a complete study of Gate lithography level measurement on standard products has been conducted. Experiments were done on typical ST batches for 120, 90, and 65 nm nodes. KLA-Tencor SpectraCD SE system is used to collect and analyze line critical dimensions and profiles. A systematic correlation with Scanning Electron Microscope (SEM) is done, completed by a cross section analysis. The study also takes into account lithography defect anlysis using a specific targets with intentionally generated process failures. Our objective is to determine the sensitivity window of such measurment technique to process defect and marginal process conditions. We show that KLA-Tencor SpectraCD allows a full reconstruction of the line profile - as well as the film stack underneath it - with values that are in agreement with production control. Cpm values obtained on products demonstrate that SE based scatterometry fulfils all requirements to be integrated in a production envrionemnt and provides suitable metrology for advanced lithography process monitoring.

© (2003) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

David Herisson ; DaniEle Neira ; Cyril Fernand ; Philippe Thony ; Daniel Henry, et al.
"Spectroscopic ellipsometry for lithography front-end level CD control: a complete analysis for production integration", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, 264 (May 27, 2003); doi:10.1117/12.485031; http://dx.doi.org/10.1117/12.485031


Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).

Figures

Tables

NOTE:
Citing articles are presented as examples only. In non-demo SCM6 implementation, integration with CrossRef’s "Cited By" API will populate this tab (http://www.crossref.org/citedby.html).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.