Toward the global optimum in lithographic lens design

Aurelian Dodoc

doi:10.1117/12.868530

9 September 2010 Toward the global optimum in lithographic lens design

Aurelian Dodoc

Proceedings Volume 7652, International Optical Design Conference 2010; 76522B (2010) https://doi.org/10.1117/12.868530
Event: International Optical Design Conference 2010, 2010, Jackson Hole, WY, United States

Abstract

Significant advances have been made in recent years in the development of lithography optics. The resolution of structures smaller than 45 nm demanded a new class of catadioptric objective lenses whose design and construction is the result of decades of development in lithography optics. This article describes the best-performing lens types and design principles of the catadioptric concept of these lenses.

Citation Download Citation

Aurelian Dodoc "Toward the global optimum in lithographic lens design", Proc. SPIE 7652, International Optical Design Conference 2010, 76522B (9 September 2010); https://doi.org/10.1117/12.868530

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available