New method to enhance overlay tool performance

Ravikiran Attota; Richard M. Silver; Michael T. Stocker; Egon Marx; Jau-Shi Jay Jun; Mark P. Davidson; Robert D. Larrabee

doi:10.1117/12.488481

2 June 2003 New method to enhance overlay tool performance

Ravikiran Attota, Richard M. Silver, Michael T. Stocker, Egon Marx, Jau-Shi Jay Jun, Mark P. Davidson, Robert D. Larrabee

Author Affiliations +

Proceedings Volume 5038, Metrology, Inspection, and Process Control for Microlithography XVII; (2003) https://doi.org/10.1117/12.488481
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

New methods to enhance and improve algorithm performance and data analysis are being developed at NIST for overlay measurement applications. Both experimental data and improved theoretical optical scattering models have been used for the study. We have identified error sources that arise from (i) the optical cross talk between neighboring lines on an overlay target (ii) the selection of the window size used in the auto-correlation and (iii) the portion of the intensity profile that is used in the overlay calculation (defined as a truncated profile). Further, we suggest methods to optimally minimize these error sources. We also present a relationship between tool-induced shift (TIS) and the asymmetry in the intensity profile.

Citation Download Citation

Ravikiran Attota, Richard M. Silver, Michael T. Stocker, Egon Marx, Jau-Shi Jay Jun, Mark P. Davidson, and Robert D. Larrabee "New method to enhance overlay tool performance", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); https://doi.org/10.1117/12.488481

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