Contact hole inspection by real-time optical CD metrology

Jon L. Opsal; Hanyou Chu; Youxian Wen; Guangwei Li; Yia-Chung Chang

doi:10.1117/12.487607

2 June 2003 Contact hole inspection by real-time optical CD metrology

Jon L. Opsal, Hanyou Chu, Youxian Wen, Guangwei Li, Yia-Chung Chang

Proceedings Volume 5038, Metrology, Inspection, and Process Control for Microlithography XVII; (2003) https://doi.org/10.1117/12.487607
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

We have developed fast numerical solutions to the diffraction of light from a periodic array of contact holes (CH) in microelectronic structures. We present results for contact holes in oxide and in 193 nm and 248 nm photoresists. We also show detectability limits of the CH and observed variations across wafers processed with state-of-the-art lithography.

Citation Download Citation

Jon L. Opsal, Hanyou Chu, Youxian Wen, Guangwei Li, and Yia-Chung Chang "Contact hole inspection by real-time optical CD metrology", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); https://doi.org/10.1117/12.487607

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