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Proceedings Article

Evaluation of Litel's in-situ interferometer (ISI) technique for measuring projection-lens aberrations: an initial study

[+] Author Affiliations
Peter De Bisschop

IMEC (Belgium)

Proc. SPIE 5040, Optical Microlithography XVI, 11 (June 25, 2003); doi:10.1117/12.485525
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From Conference Volume 5040

  • Optical Microlithography XVI
  • Anthony Yen
  • Santa Clara, CA | February 23, 2003

abstract

We have set up a series of experiments to evaluate the Litel In-Situ Interferometer (ISI) for measuring projection-lens aberrations of lithographic exposure tools. The current paper describes the results we obtained so far. We believe the ISI is an excellent tool.

© (2003) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Peter De Bisschop
"Evaluation of Litel's in-situ interferometer (ISI) technique for measuring projection-lens aberrations: an initial study", Proc. SPIE 5040, Optical Microlithography XVI, 11 (June 25, 2003); doi:10.1117/12.485525; http://dx.doi.org/10.1117/12.485525


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