Paper
26 June 2003 Sol-gel fabrication of high-quality photomask substrates
Rahul Ganguli, D. Laurence Meixner, Steve G. Colbern, Matt S. Gleason, Douglas E. Meyers, Satyabrata Ray Chaudhuri
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Abstract
Synthetic silica photomask substrates are currently manufactured by cutting, grinding, and polishing glass boules prepared using a flame hydrolysis process. YTC America is developing an alternative technique, based on sol-gel processing, to fabricate high quality substrates. This new technology allows near net shape fabrication of synthetic silica monoliths, thus eliminating the need for cutting and grinding. The complex relationship between glass properties and process parameters in the formulation, drying, and sintering steps has been determined, and a repeatable process has been established. These substrates meet all SEMI specifications for ULTE hard surface photomask substrates for 248-nm lithography. The technology may also be extended to 193-nm and 157-nm photomask substrates. This sol-gel-based process may represent a unique and cost-effective alternative for manufacturing photomask substrates for deep UV lithography.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rahul Ganguli, D. Laurence Meixner, Steve G. Colbern, Matt S. Gleason, Douglas E. Meyers, and Satyabrata Ray Chaudhuri "Sol-gel fabrication of high-quality photomask substrates", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485341
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KEYWORDS
Sol-gels

Glasses

Photomasks

Silica

Fluorine

Deep ultraviolet

Birefringence

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