Study of characteristics and control of haze contamination induced by photochemical reaction

Sung-Jae Han; Sang-Yong Yu; Moon-Gyu Sung; Yong-Hoon Kim; Hee-Sun Yoon; Jung-Min Sohn

doi:10.1117/12.504277

28 August 2003 Study of characteristics and control of haze contamination induced by photochemical reaction

Sung-Jae Han, Sang-Yong Yu, Moon-Gyu Sung, Yong-Hoon Kim, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.504277
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan

Abstract

Haze is a kind of surface contamination on photomask and lithography optics that made by photochemical reaction. There are many problems in photomask manufacturing, inspection and lithography process because of slowly growing feature of haze. In the photolithography process, the wafer damage has been occurred due to the time dependent growth of haze. In this study, we identified the origin and formation mechanism of haze using accelerated contamination experiments, also developed control method for haze, in which the removal efficiency was confirmed by mass production of photomask. From these results we expect that the photocontamination control technology should be developed and been an important part of NGL technology.

Citation Download Citation

Sung-Jae Han, Sang-Yong Yu, Moon-Gyu Sung, Yong-Hoon Kim, Hee-Sun Yoon, and Jung-Min Sohn "Study of characteristics and control of haze contamination induced by photochemical reaction", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); https://doi.org/10.1117/12.504277

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