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Proceedings Article

Recent advances in blazed grating fabrication by electron-beam lithography

[+] Author Affiliations
Daniel W. Wilson, Paul D. Maker, Richard E. Muller, Pantazis Z. Mouroulis, Johan Backlund

Jet Propulsion Lab. (USA)

Proc. SPIE 5173, Current Developments in Lens Design and Optical Engineering IV, 115 (November 3, 2003); doi:10.1117/12.510204
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From Conference Volume 5173

  • Current Developments in Lens Design and Optical Engineering IV
  • Pantazis Z. Mouroulis; Warren J. Smith; R. Barry Johnson
  • San Diego, California, USA | August 03, 2003

abstract

Convex and concave diffraction gratings are required for concentric imaging spectrometer forms. Direct-write electron-beam lithography has proven to be an effective method for fabricating high-efficiency blazed gratings on non-flat substrates. Recently fabricated convex gratings have demonstrated relative efficiency greater than 90%, diffuse scatter and ghosts less than 5x10-4 of the main diffraction order, and zeroth-order wavefront error less than 1/4-wave at 633 nm. Such gratings can be fabricated on JPL"s JEOL JBX-9300FS electron-beam lithography system with a writing speed of approximately 1 to 2 cm2 per hour. The technique was recently used to fabricate flight-qualified gratings for the Compact Reconnaissance Imaging Spectrometer for Mars (CRISM) instrument that is scheduled to fly on the NASA Mars Reconnaissance Orbiter in 2005.

© (2003) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Daniel W. Wilson ; Paul D. Maker ; Richard E. Muller ; Pantazis Z. Mouroulis and Johan Backlund
"Recent advances in blazed grating fabrication by electron-beam lithography", Proc. SPIE 5173, Current Developments in Lens Design and Optical Engineering IV, 115 (November 3, 2003); doi:10.1117/12.510204; http://dx.doi.org/10.1117/12.510204


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