Recent advances in blazed grating fabrication by electron-beam lithography

Daniel W. Wilson; Paul D. Maker; Richard E. Muller; Pantazis Z. Mouroulis; Johan Backlund

doi:10.1117/12.510204

3 November 2003 Recent advances in blazed grating fabrication by electron-beam lithography

Daniel W. Wilson, Paul D. Maker, Richard E. Muller, Pantazis Z. Mouroulis, Johan Backlund

Proceedings Volume 5173, Current Developments in Lens Design and Optical Engineering IV; 51730E (2003) https://doi.org/10.1117/12.510204
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

Convex and concave diffraction gratings are required for concentric imaging spectrometer forms. Direct-write electron-beam lithography has proven to be an effective method for fabricating high-efficiency blazed gratings on non-flat substrates. Recently fabricated convex gratings have demonstrated relative efficiency greater than 90%, diffuse scatter and ghosts less than 5x10^-4 of the main diffraction order, and zeroth-order wavefront error less than 1/4-wave at 633 nm. Such gratings can be fabricated on JPL’s JEOL JBX-9300FS electron-beam lithography system with a writing speed of approximately 1 to 2 cm² per hour. The technique was recently used to fabricate flight-qualified gratings for the Compact Reconnaissance Imaging Spectrometer for Mars (CRISM) instrument that is scheduled to fly on the NASA Mars Reconnaissance Orbiter in 2005.

Citation Download Citation

Daniel W. Wilson, Paul D. Maker, Richard E. Muller, Pantazis Z. Mouroulis, and Johan Backlund "Recent advances in blazed grating fabrication by electron-beam lithography", Proc. SPIE 5173, Current Developments in Lens Design and Optical Engineering IV, 51730E (3 November 2003); https://doi.org/10.1117/12.510204

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