Mueller matrix polarimeter in 157 nm

Lianhua Jin; Hiroyuki Kowa; Yukitoshi Otani; Norihiro Umeda

doi:10.1117/12.507038

4 November 2003 Mueller matrix polarimeter in 157nm

Lianhua Jin, Hiroyuki Kowa, Yukitoshi Otani, Norihiro Umeda

Proceedings Volume 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies; (2003) https://doi.org/10.1117/12.507038
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

A vacuum Mueller matrix polarimeter is developed for measurement of the Mueller matrix of samples, partially, calcium fluoride materials in 157nm wavelength. From the measured Mueller matrix with no sample present, we found the influence of absorption error in the detector and orientation error in quarter-wave plates on measurement results. The birefringence of samples is determined from the Mueller matrix. Experimental results show this Mueller matrix polarimeter is available to be used for characterizing the intrinsic birefringence of materials for processed lens at the 157nm lithography.

Citation Download Citation

Lianhua Jin, Hiroyuki Kowa, Yukitoshi Otani, and Norihiro Umeda "Mueller matrix polarimeter in 157nm", Proc. SPIE 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies, (4 November 2003); https://doi.org/10.1117/12.507038

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