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Proceedings Article

Studies of femtosecond laser induced damage of HfO2 thin film in atmospheric and vacuum environments

[+] Author Affiliations
D. N. Nguyen, L. A. Emmert, W. Rudolph

The Univ. of New Mexico (USA)

D. Patel, E. Krous, C. S. Menoni

Colorado State Univ. (USA)

M. Shinn

Thomas Jefferson National Accelerator Facility (USA)

Proc. SPIE 7504, Laser-Induced Damage in Optical Materials: 2009, 750403 (December 29, 2009); doi:10.1117/12.836505
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From Conference Volume 7504

  • Laser-Induced Damage in Optical Materials: 2009
  • Gregory J. Exarhos; Vitaly E. Gruzdev; Detlev Ristau; M. J. Soileau; Christopher J. Stolz
  • Boulder, CO | September 21, 2009

abstract

The single pulse femtosecond laser induced damage threshold (LIDT) of hafnia and silica films is not affected by the ambient gas pressure. In vacuum, the multiple pulse LIDT drops to ~10% (~10%) of its atmospheric value for hafnia (silica). The water vapor content of the ambient gas was found to control the change in the LIDT. The LIDT of bulk fused silica surfaces did now show any dependence on the ambient gas pressure. Hydrocarbons (toluene) did not change the multiple pulse LIDT for Hafnia films

© (2009) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

D. N. Nguyen ; L. A. Emmert ; W. Rudolph ; D. Patel ; E. Krous, et al.
"Studies of femtosecond laser induced damage of HfO2 thin film in atmospheric and vacuum environments", Proc. SPIE 7504, Laser-Induced Damage in Optical Materials: 2009, 750403 (December 29, 2009); doi:10.1117/12.836505; http://dx.doi.org/10.1117/12.836505


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