Paper
24 November 2009 Study on infrared optical switching of vanadium dioxide thin film
Haifang Wang, Yi Li, Xiaojing Yu, Huiqun Zhu, Yize Huang, Hu Zhang, Wei Zhang
Author Affiliations +
Proceedings Volume 7509, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Devices and Integration; 75090P (2009) https://doi.org/10.1117/12.837452
Event: International Conference on Optical Instrumentation and Technology, 2009, Shanghai, China
Abstract
Dispersion theory for refractive index and extinction coefficient of vanadium dioxide thin film is studied, and its temperature-dependence dispersion formula of optical constants is presented by numerical fitting with Sellmeier dispersion model. The optical transmittance and reflectance at different temperature and wavelength is calculated using film matrix theory. Vanadium dioxide thin films with different thickness are deposited by magnetron sputtering on glass, sapphire and silicon dioxide substrates, and the optical transmittance and reflectivity of the films are measured, and the experiment curve agrees well with that of simulation.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Haifang Wang, Yi Li, Xiaojing Yu, Huiqun Zhu, Yize Huang, Hu Zhang, and Wei Zhang "Study on infrared optical switching of vanadium dioxide thin film", Proc. SPIE 7509, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Devices and Integration, 75090P (24 November 2009); https://doi.org/10.1117/12.837452
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KEYWORDS
Thin films

Vanadium

Refractive index

Transmittance

Sputter deposition

Reflectivity

Infrared radiation

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