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Proceedings Article

Enhancement of ablation efficiency by a femto/nano-second dual-beam micromachining system

[+] Author Affiliations
Cheng-Hsiang Lin, Zheng-Hua Rao, Hai-Lung Tsai

Missouri Univ. of Science and Technology (USA)

Lan Jiang

Beijing Institute of Technology (China)

Wu-Jung Tsai, Ping-Han Wu, Chih-Wei Chien

Industrial Technology Research Institute (Taiwan)

Proc. SPIE 7585, Laser-based Micro- and Nanopackaging and Assembly IV, 75850I (February 23, 2010); doi:10.1117/12.842733
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From Conference Volume 7585

  • Laser-based Micro- and Nanopackaging and Assembly IV
  • Wilhelm Pfleging; Yongfeng Lu; Kunihiko Washio; Jun Amako; Willem Hoving
  • San Francisco, California, USA | January 23, 2010

abstract

In this paper, a dual-beam laser micromachining system consisting of a femtosecond (fs) laser and a nanosecond (ns) laser has been developed to enhance the ablation efficiency. Experiments were conducted in different materials including dielectric (fused silica), semiconductor (silicon wafer), and metal (aluminum alloys). The amount of material being removed was determined for fs pulses alone, ns pulses alone, and pairs of fs and ns pulses with different time lags in between. It was found that the material removal efficiency increases in the dual-beam process for all materials being studied as compared to the fs alone or ns alone, particularly for dielectrics. The highest ablation efficiency for fused silica occurs when the fs pulse is shot near the peak of the ns pulse envelope. A corresponding numerical model for dual beam ablation of dielectrics was also developed by integrating the plasma model, the improved two-temperature model, and Fourier's law to understand the laser-material interaction. It was found that the fs laser pulse can significantly increase the free electron density and change the optical properties of the dielectric, leading to the increase of absorption for the subsequent ns pulse energy. This study provides a fundamental understanding for the enhancement of material ablation efficiency, particularly for wide-bandgap dielectrics.

© (2010) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Cheng-Hsiang Lin ; Zheng-Hua Rao ; Lan Jiang ; Wu-Jung Tsai ; Ping-Han Wu, et al.
"Enhancement of ablation efficiency by a femto/nano-second dual-beam micromachining system", Proc. SPIE 7585, Laser-based Micro- and Nanopackaging and Assembly IV, 75850I (February 23, 2010); doi:10.1117/12.842733; http://dx.doi.org/10.1117/12.842733


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