Paper
26 February 2010 Fabrication of Al2O3/TiO2 multilayer mirrors for water-window attosecond pulses
Yuji Tanaka, Masaki Murata, Hiroshi Kumagai, Ataru Kobayashi, Tsutomu Shinagawa
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Abstract
Novel metal-oxide multilayer mirrors for water-window wavelengths have been already studied and then fabricated by atomic layer deposition (ALD) or atomic layer epitaxy (ALE) methods which have the self-limiting nature of the surface reactions and can control thickness on an atomic scale over large areas. The reason why metal-oxide multilayer mirrors are effective in the water-window wavelength is that they can prevent the formation of various alloys at the interface resulting in scattering loss, and the absorption of oxygen in oxides is negligible at the wavelength. In this study, high and low refractive materials were chosen to be TiO2 and Al2O3 respectively, because they can be fabricated by ALD or ALE methods and Ti L-absorption edge is located at 2.73nm. We investigated the atomic-scale growth of these films and then found that the growth rates could be constant. Moreover, Al2O3/TiO2 multilayer mirrors were fabricated by the ALE method. As a result, the soft x-ray reflectivity of the 10-bilayer mirror was 1.54%, approximately.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuji Tanaka, Masaki Murata, Hiroshi Kumagai, Ataru Kobayashi, and Tsutomu Shinagawa "Fabrication of Al2O3/TiO2 multilayer mirrors for water-window attosecond pulses", Proc. SPIE 7586, Synthesis and Photonics of Nanoscale Materials VII, 75860J (26 February 2010); https://doi.org/10.1117/12.840850
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KEYWORDS
Multilayers

Mirrors

Focus stacking software

Titanium dioxide

Reflectivity

X-rays

Atomic layer deposition

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