Paper
25 February 2010 Picosecond laser patterning of NiCr thin film strain gages
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Abstract
This paper presents results of ablation experiments of NiCr layers with thicknesses ranging from 23nm to 246nm on Al2O3 substrates. Investigated parameters are fluence, number of pulses, film thickness and substrate roughness. The influence of the parameters on the removal threshold is analyzed in order to identify stable processing parameters. Patterned NiCr thin films as an essential component for the measurement of mechanical stress are required for the development of sputtered thin film strain gages. With this new approach strain sensors will be resistant against creeping or swelling through changing ambient conditions unlike conventional strain gages.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Oliver Suttmann, Michael Gosselin, Ulrich Klug, and Rainer Kling "Picosecond laser patterning of NiCr thin film strain gages", Proc. SPIE 7589, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications X, 758914 (25 February 2010); https://doi.org/10.1117/12.840842
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Cited by 3 scholarly publications.
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KEYWORDS
Laser ablation

Thin films

Optical lithography

Polishing

Sensors

Aluminum

Picosecond phenomena

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