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Proceedings Article

Optimality of pupil-phase profiles for increasing the defocus tolerance of hybrid digital-optical imaging systems

[+] Author Affiliations
Tom Vettenburg, Andrew R. Harvey

Heriot-Watt Univ. (United Kingdom)

Andrew Wood, Nicholas Bustin

Qioptiq Ltd. (United Kingdom)

Proc. SPIE 7429, Novel Optical Systems Design and Optimization XII, 742903 (August 21, 2009); doi:10.1117/12.825119
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From Conference Volume 7429

  • Novel Optical Systems Design and Optimization XII
  • R. John Koshel; G. Groot Gregory
  • San Diego, CA | August 02, 2009

abstract

A phase mask at the aperture stop of a hybrid digital-optical imaging system can improve its tolerance to aberrations. The choice of the introduced phase modulation is crucial in the design of such systems. Several successful phase masks have been described in the literature. These masks are typically derived by searching for optical-transfer-functions that retain restorability under aberrations such as defocus. Instead of optimizing the optical-transfer-function for some desired characteristics, we calculate the expected imaging error of the joint design directly. This was used to compare thirddegree polynomial phase masks, including the cubic phase profile and a commonly used generalization. The analysis shows how the optimal phase profile depth is always limited by noise and more importantly, numerical simulations show that only a finite range of the third-degree polynomial profiles yield optimal performance.

© (2009) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Tom Vettenburg ; Andrew Wood ; Nicholas Bustin and Andrew R. Harvey
"Optimality of pupil-phase profiles for increasing the defocus tolerance of hybrid digital-optical imaging systems", Proc. SPIE 7429, Novel Optical Systems Design and Optimization XII, 742903 (August 21, 2009); doi:10.1117/12.825119; http://dx.doi.org/10.1117/12.825119


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