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Proceedings Article

Impact of illumination source symmetrization in OPC

[+] Author Affiliations
John L. Sturtevant, Le Hong, Srividya Jayaram

Mentor Graphics Corp.

Stephen P. Renwick

Nikon Precision

Martin McCallum

Nikon Precision Europe GmbH (United Kingdom)

Peter De Bisschop

IMEC (Belgium)

Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70283M (May 10, 2008); doi:10.1117/12.799411
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From Conference Volume 7028

  • Photomask and Next-Generation Lithography Mask Technology XV
  • Toshiyuki Horiuchi
  • Yokohama, Japan | April 16, 2008

abstract

It is well known that optical proximity effects are highly dependent upon the details of the illumination source. Tremendous effort is taken to match illumination source profiles between tools, as well as to appropriately represent the source intensity distribution in the models used for OPC and post-OPC verification. OPC software typically models the intensity profile in such a manner that empirical fitting of the CD data during model calibration can result in a representation of the "effective" source. In some cases, an actual measured source profile is available and can be referenced directly in the OPC recipe. However, it is common to average the 4 quadrants of a measured source profile such that the source representation is symmetrical about the x and y axes. This is done so that optical proximity correction can be applied hierarchically, with a single correction applied to a cell which may be instantiated in multiple orientations within the chip. It has generally been accepted that the positive runtime benefit accompanying this symmetrization is beneficial relative to any potential accuracy loss for cells oriented in different directions. In this paper, we investigate the impact of real source profile asymmetries on identical features with different orientations.

© (2008) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

John L. Sturtevant ; Le Hong ; Srividya Jayaram ; Stephen P. Renwick ; Martin McCallum, et al.
"Impact of illumination source symmetrization in OPC", Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70283M (May 10, 2008); doi:10.1117/12.799411; http://dx.doi.org/10.1117/12.799411


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