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Proceedings Article

Deposition and characterization of challenging DUV coatings

[+] Author Affiliations
Parag Kelkar, Bruce Tirri, Ron Wilklow, David Peterson

ASML US, Inc. (USA)

Proc. SPIE 7067, Advances in Thin-Film Coatings for Optical Applications V, 706708 (August 29, 2008); doi:10.1117/12.794752
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From Conference Volume 7067

  • Advances in Thin-Film Coatings for Optical Applications V
  • Jennifer D. T. Kruschwitz; Michael J. Ellison
  • San Diego, California, USA | August 10, 2008

abstract

As deep ultra-violet (DUV) wavelength optical systems progress towards higher numerical aperture (NA), at least some of the lens surfaces in the system approach almost complete hemispherical shape and some of the lens surfaces have very high angle of incidence (AOI) requirements. The antireflection (AR) coating designs for such lens surfaces must address intensity apodization due to coating thickness nonuniformity and polarization purity. We present some of the recent results in the area of DUV coatings that highlight these challenges and demonstrate production capability.

© (2008) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Parag Kelkar ; Bruce Tirri ; Ron Wilklow and David Peterson
"Deposition and characterization of challenging DUV coatings", Proc. SPIE 7067, Advances in Thin-Film Coatings for Optical Applications V, 706708 (August 29, 2008); doi:10.1117/12.794752; http://dx.doi.org/10.1117/12.794752


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