Paper
17 October 2008 True reticle cost saving by multi level reticle approach
Thomas Struck, Hendrik Kirbach
Author Affiliations +
Abstract
Today reticle costs become one of the main contributors in the cost of manufacturing of advanced logic products. Especially for low volume projects as of product sampling as well as design and product verifications the saving of reticle costs becomes worthwhile. Multi level reticles are the combination of more then one lithographical layer on one physical reticle. Due to this approach the physical amount of reticles per tape out will be reduced and thereby also the costs for reticles will be significantly decreased. The multi level reticle approach is implemented as standard option in the INFINEON Technologies tape out flow for advanced logic products. This means dependent on forecasted volume and chip size it could be decided to tape out a project on multi level- or single level reticle. Technical setup, reticle layout, specification, CAD flow and experience in daily work using multi level reticles in different design nodes will be shown. Reticle cost advantage versus reduced throughput will be discussed.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Thomas Struck and Hendrik Kirbach "True reticle cost saving by multi level reticle approach", Proc. SPIE 7122, Photomask Technology 2008, 712233 (17 October 2008); https://doi.org/10.1117/12.800920
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KEYWORDS
Reticles

Photomasks

Semiconducting wafers

Manufacturing

Computer aided design

Logic

Prototyping

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