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Proceedings Article

Laser damage growth in fused silica with simultaneous 351nm and 1053nm irradiation

[+] Author Affiliations
Mary A. Norton, Adra V. Carr, C. Wren Carr, Eugene E. Donohue, Michael D. Feit, William G. Hollingsworth, Zhi Liao, Raluca A. Negres, Alexander M. Rubenchik, P. J. Wegner

Lawrence Livermore National Lab. (USA)

Proc. SPIE 7132, Laser-Induced Damage in Optical Materials: 2008, 71321H (December 30, 2008); doi:10.1117/12.804432
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From Conference Volume 7132

  • Laser-Induced Damage in Optical Materials: 2008
  • Gregory J. Exarhos; Detlev Ristau; M. J. Soileau; Christopher J. Stolz
  • Boulder, CO | September 22, 2008

abstract

Laser-induced growth of optical damage often determines the useful lifetime of an optic in a high power laser system. We have extended our previous work on growth of laser damage in fused silica with simultaneous 351 nm and 1053 nm laser irradiation by measuring the threshold for growth with various ratios of 351 nm and 1053 nm fluence. Previously we reported that when growth occurs, the growth rate is determined by the total fluence. We now find that the threshold for growth is dependent on both the magnitude of the 351 nm fluence as well as the ratio of the 351 nm fluence to the 1053 nm fluence. Furthermore, the data suggests that under certain conditions the 1053 nm fluence does not contribute to the growth.

© (2008) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Mary A. Norton ; Adra V. Carr ; C. Wren Carr ; Eugene E. Donohue ; Michael D. Feit, et al.
"Laser damage growth in fused silica with simultaneous 351nm and 1053nm irradiation", Proc. SPIE 7132, Laser-Induced Damage in Optical Materials: 2008, 71321H (December 30, 2008); doi:10.1117/12.804432; http://dx.doi.org/10.1117/12.804432


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