Full Content is available to subscribers

Subscribe/Learn More  >
Proceedings Article

An update on the DPL overlay discontinuity

[+] Author Affiliations
Mike Adel

KLA-Tencor Israel (Israel)

Proc. SPIE 7140, Lithography Asia 2008, 71400K (December 04, 2008); doi:10.1117/12.808005
Text Size: A A A
From Conference Volume 7140

  • Lithography Asia 2008
  • Alek C. Chen; Burn Lin; Anthony Yen
  • Taipei, Taiwan | November 04, 2008

abstract

It could be argued that the biggest challenge of the 32 nm half pitch node is the production implementation of double patterning lithography. Within the framework of this broad domain, a specific challenge which has been highlighted is overlay control due to the sharing between two exposures the overlay control allocation of a single patterning step. The models used in the literature to support this assertion are reviewed and compared with recent results. An analysis of the implications for overlay metrology performance and cost of ownership is presented and compared with actual capabilities currently available with both imaging and scatterometry sensor technology. Technology matching between imaging and scatterometry emerges as a requirement to enable combined imaging scatterometry overlay control use cases.

© (2008) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Mike Adel
"An update on the DPL overlay discontinuity", Proc. SPIE 7140, Lithography Asia 2008, 71400K (December 04, 2008); doi:10.1117/12.808005; http://dx.doi.org/10.1117/12.808005


Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).

Figures

Tables

NOTE:
Citing articles are presented as examples only. In non-demo SCM6 implementation, integration with CrossRef’s "Cited By" API will populate this tab (http://www.crossref.org/citedby.html).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.