The impact of illuminator signatures on optical proximity effects

Jacek K. Tyminski; Stephen P. Renwick

doi:10.1117/12.804488

4 December 2008 The impact of illuminator signatures on optical proximity effects

Proceedings Volume 7140, Lithography Asia 2008; 71402A (2008) https://doi.org/10.1117/12.804488
Event: SPIE Lithography Asia - Taiwan, 2008, Taipei, Taiwan

Abstract

Low pass filtering taking place in the projection tools used by the IC industry leads to a range of optical proximity effects, OPEs, resulting in undesired characteristics of patterns projected by the scanners. Commonly used scanner imaging models are capable of capturing OPEs driven by the fundamental imaging conditions such as wavelength, illuminator layout, reticle technology, and lens numerical aperture.

Citation Download Citation

Jacek K. Tyminski and Stephen P. Renwick "The impact of illuminator signatures on optical proximity effects", Proc. SPIE 7140, Lithography Asia 2008, 71402A (4 December 2008); https://doi.org/10.1117/12.804488

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