Formation of deep acceptor centers in AlGaN alloys

L. Dimitrocenko; J. Grube; P. Kulis; A. Sarakovskis; M. Springis; I. Tale

doi:10.1117/12.816864

2 December 2008 Formation of deep acceptor centers in AlGaN alloys

L. Dimitrocenko, J. Grube, P. Kulis, A. Sarakovskis, M. Springis, I. Tale

Proceedings Volume 7142, Sixth International Conference on Advanced Optical Materials and Devices (AOMD-6); 71420P (2008) https://doi.org/10.1117/12.816864
Event: Sixth International Conference on Advanced Optical Materials and Devices, 2008, Riga, Latvia

Abstract

AlGaN alloy thin film materials are of high interest for light emitting diodes (LED of the ultraviolet (UV) spectral region. Origin of the deep intrinsic and impurity Si states in the Al_xGa_1-xN (0 < x < 0.35) epilayer structures grown by metalorganic chemical vapor deposition (MOCVD) technique have been considered. Effects of the lattice mismatch and Si-doping in the heterostructures of epilayers with different alloy composition are investigated using time resolved photoluminescence (PL) of donor - deep acceptor (DA) pairs. It is shown that the undoped AlGaN alloys, grown on a GaN buffer layer, due to the lattice mismatch contain the increased concentration of cation vacancy (V_cation) defects acting as a deep acceptor centers and responsible for PL. Si-doping results in both the additional increase of V_cation concentration and the formation in cation sub lattice of new (V_cationSi_cation) deep acceptor complexes. It is shown that by increase of the Al content in the AlGaN alloy the composition disorder of both deep acceptor centers V_cation and (V_cationSi_cation) complex appears. The corresponding broad PL bands are resolved in number of subbands. It is stated that deposition of Si-doped AlGaN alloy on undoped GaN results in formation of Si-doped GaN interlayer.

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L. Dimitrocenko, J. Grube, P. Kulis, A. Sarakovskis, M. Springis, and I. Tale "Formation of deep acceptor centers in AlGaN alloys", Proc. SPIE 7142, Sixth International Conference on Advanced Optical Materials and Devices (AOMD-6), 71420P (2 December 2008); https://doi.org/10.1117/12.816864

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KEYWORDS

Gallium nitride

Luminescence

Silicon

Aluminum

Excitons

Doping

Ultraviolet radiation

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