Evolution of near-field electromagnetic interference by metallic nanostructures

Jaehyuk Kim; Kewseung Lee; Honggyu An; Eunhee Jeang; Daegeun Kim; Hyeonjin Doh; Dong-Soo Shin; Seung-Han Park

doi:10.1117/12.809901

24 February 2009 Evolution of near-field electromagnetic interference by metallic nanostructures

Jaehyuk Kim, Kewseung Lee, Honggyu An, Eunhee Jeang, Daegeun Kim, Hyeonjin Doh, Dong-Soo Shin, Seung-Han Park

Proceedings Volume 7211, Physics and Simulation of Optoelectronic Devices XVII; 72110R (2009) https://doi.org/10.1117/12.809901
Event: SPIE OPTO: Integrated Optoelectronic Devices, 2009, San Jose, California, United States

Abstract

We have investigated the intensity distribution through metallic nano double slit and nano double box by two dimensional finite-difference time-domain (FDTD) method based on Drude model. In particular, we find that there is an 'intermediate region' between near-field and far-field regions which varies with thickness and width of double slit. We will present the local fields propagating along and perpendicular to metal surface and their spatial distributions to verify the existence of the intermediate region.

Citation Download Citation

Jaehyuk Kim, Kewseung Lee, Honggyu An, Eunhee Jeang, Daegeun Kim, Hyeonjin Doh, Dong-Soo Shin, and Seung-Han Park "Evolution of near-field electromagnetic interference by metallic nanostructures", Proc. SPIE 7211, Physics and Simulation of Optoelectronic Devices XVII, 72110R (24 February 2009); https://doi.org/10.1117/12.809901

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