Integration of optical inspection and metrology functions into DUV femtosecond laser repair tool for large-area FPD photomasks

Leon Treyger; Jon Heyl; Donald Ronning; Donald Ducharme

doi:10.1117/12.729006

15 May 2007 Integration of optical inspection and metrology functions into DUV femtosecond laser repair tool for large-area FPD photomasks

Leon Treyger, Jon Heyl, Donald Ronning, Donald Ducharme

Author Affiliations +

Proceedings Volume 6607, Photomask and Next-Generation Lithography Mask Technology XIV; 66072N (2007) https://doi.org/10.1117/12.729006
Event: Photomask and Next-Generation Lithography Mask Technology XIV, 2007, Yokohama, Japan

Abstract

In this paper we describe the early stages of introduction of the inspection and metrology capabilities for the large area mask repair tools. Commercially available MRT platform was used as a basis for integration of defect repair, metrology, review, inspection, and verification functions into a single MiRT prototype system. This system was designed for large area LCD/PDP photomasks of Generation 7 and beyond. Advanced DUV femtosecond laser technology was developed for repair of both clear and opaque defects on Chrome-on-Glass masks using laser CVD and laser ablation. Specifics of the system design and architecture is discussed. Laser processing module was based on the projection optics with imaged aperture. Image formation in such optical system is reviewed and outcome of the computer simulation is compared with the experimental data. For the first time, we report results of the feasibility study of grayscale photomask repair using laser CVD technology. By carefully controlling process parameters, we were able to deposit films with different thickness and therefore variable transmittance. We also discuss die-to-database inspection of half-tone masks and capabilities of the integrated metrology and review of the repaired photomask sites. Proprietary die-to-database inspection and verification algorithms combined with distributed super-fast computer architecture allowed effective process control with accurate, repeatable, and timely measurements. Different subsystems that enable integration of repair, metrology, and inspection functions into the MiRT system are discussed.

Citation Download Citation

Leon Treyger, Jon Heyl, Donald Ronning, and Donald Ducharme "Integration of optical inspection and metrology functions into DUV femtosecond laser repair tool for large-area FPD photomasks", Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66072N (15 May 2007); https://doi.org/10.1117/12.729006

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KEYWORDS

Photomasks

Inspection

Metrology

Chemical vapor deposition

Computer aided design

Laser processing

Femtosecond phenomena

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