Paper
10 September 2007 A structure that more than doubles the intensity of an enhanced backscattering peak
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Abstract
We present approaches to the design of a structure that produces an enhanced backscattering peak the ratio of whose height relative to the height of the background at its position can be as high as 40-50.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
T. A. Leskova, A. A. Maradudin, E. R. Méndez, and Zu-Han Gu "A structure that more than doubles the intensity of an enhanced backscattering peak", Proc. SPIE 6672, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies III, 66720G (10 September 2007); https://doi.org/10.1117/12.735043
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KEYWORDS
Backscatter

Light scattering

Scattering

Reflection

Interfaces

Dielectrics

Mirrors

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