MOSAIC: a new wavefront metrology

Christopher N. Anderson; Patrick P. Naulleau

doi:10.1117/12.814303

23 March 2009 MOSAIC: a new wavefront metrology

Christopher N. Anderson, Patrick P. Naulleau

Proceedings Volume 7272, Metrology, Inspection, and Process Control for Microlithography XXIII; 72720B (2009) https://doi.org/10.1117/12.814303
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

MOSAIC is a new wavefront metrology that enables complete wavefront characterization from print or aerial image based measurements. Here we describe MOSAIC and verify its utility with a model-based proof of principle.

Citation Download Citation

Christopher N. Anderson and Patrick P. Naulleau "MOSAIC: a new wavefront metrology", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72720B (23 March 2009); https://doi.org/10.1117/12.814303

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