Investigation of factors causing difference between simulation and real SEM image

M. Kadowaki; A. Hamaguchi; H. Abe; Y. Yamazaki; S. Borisov; A. Ivanchikov; S. Babin

doi:10.1117/12.814036

23 March 2009 Investigation of factors causing difference between simulation and real SEM image

M. Kadowaki, A. Hamaguchi, H. Abe, Y. Yamazaki, S. Borisov, A. Ivanchikov, S. Babin

Proceedings Volume 7272, Metrology, Inspection, and Process Control for Microlithography XXIII; 72723I (2009) https://doi.org/10.1117/12.814036
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

As the candidates of factors to consider for accurate Monte Carlo simulation of SEM images, (1) the difference of cross-section between an approximate shape for simple simulation and a real pattern shape, (2) the influence of native oxide growing on a pattern surface, and (3) the potential distribution above the target surface are proposed. Each influence on SEM signal is studied by means of experiments and simulations for a Si trench pattern as a motif. Among these factors, native oxide of about 1nm in thickness has a significant influence that increases SEM signals at the top edge and the slope. We have assumed and discussed models for the native oxide effect.

Citation Download Citation

M. Kadowaki, A. Hamaguchi, H. Abe, Y. Yamazaki, S. Borisov, A. Ivanchikov, and S. Babin "Investigation of factors causing difference between simulation and real SEM image", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72723I (23 March 2009); https://doi.org/10.1117/12.814036

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