Automated defect review of the wafer bevel with a defect review scanning electron microscope

Steve McGarvey; Masakazu Kanezawa

doi:10.1117/12.814235

23 March 2009 Automated defect review of the wafer bevel with a defect review scanning electron microscope

Steve McGarvey, Masakazu Kanezawa

Proceedings Volume 7272, Metrology, Inspection, and Process Control for Microlithography XXIII; 72723N (2009) https://doi.org/10.1117/12.814235
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

One of the few remaining bastions of non-regulated Integrated Circuit defectivity is the wafer bevel. Recent internal Integrated Circuit Manufacturing studies have suggested that the edge bevel may be responsible for as much as a two to three percent yield loss during a defect excursion on the manufacturing line and a one to two percent yield loss during ongoing wafer manufacturing. A new generation of defect inspection equipment has been introduced to the Research and Development, Integrated Circuit, MEM's and Si wafer manufacturing markets that has imparted the ability for the end equipment user to detect defects located on the bevel of the wafer. The inherent weakness of the current batch of wafer bevel inspection equipment is the lack of automatic discrete defect classification data into multiple, significant classification bins and the lack of discrete elemental analysis data. Root cause analysis is based on minimal discrete defect analysis as a surrogate for a statistically valid sampling of defects from the bevel. This paper provides a study of the methods employed with a Hitachi RS-5500EQEQ Defect Review Scanning Electron Microscope (DRSEM) to automatically capture high resolution/high magnification images and collect elemental analysis on a statistically valid sample of the discrete defects that were located by a bevel inspection system.

Citation Download Citation

Steve McGarvey and Masakazu Kanezawa "Automated defect review of the wafer bevel with a defect review scanning electron microscope", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72723N (23 March 2009); https://doi.org/10.1117/12.814235

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