Sampling for advanced overlay process control

Cindy Kato; Hiroyuki Kurita; Pavel Izikson; John C. Robinson

doi:10.1117/12.813568

23 March 2009 Sampling for advanced overlay process control

Cindy Kato, Hiroyuki Kurita, Pavel Izikson, John C. Robinson

Proceedings Volume 7272, Metrology, Inspection, and Process Control for Microlithography XXIII; 727206 (2009) https://doi.org/10.1117/12.813568
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

Overlay metrology and control have been critical for successful advanced microlithography for many years, and are taking on an even more important role as time goes on. Due to throughput constraints it is necessary to sample only a small subset of overlay metrology marks, and typical sample plans are static over time. Standard production monitoring and control involves measuring sufficient samples to calculate up to 6 linear correctables. As design rules shrink and processing becomes more complex, however, it is necessary to consider higher order models with additional degrees of freedom for control, fault detection, and disposition. This in turn, requires a higher level of sampling and a careful consideration of flyer removal. Due to throughput concerns, however, careful consideration is needed to establish a baseline sampling plan using rigorous statistical methods. This study focuses on establishing a 3x nm node immersion lithography production-worthy sampling plan for 3rd order modeling, verification of the accuracy, and proof of robustness of the sampling. In addition we discuss motivation for dynamic sampling for application to higher order modeling.

Citation Download Citation

Cindy Kato, Hiroyuki Kurita, Pavel Izikson, and John C. Robinson "Sampling for advanced overlay process control", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 727206 (23 March 2009); https://doi.org/10.1117/12.813568

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available