Full Content is available to subscribers

Subscribe/Learn More  >
Proceedings Article

Diffraction-based overlay metrology for double patterning technologies

[+] Author Affiliations
Prasad Dasari, Rahul Korlahalli, Jie Li, Nigel Smith

Nanometrics Inc. (USA)

Oleg Kritsun, Cathy Volkman

GLOBAL FOUNDRIES Inc. (USA)

Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 727212 (March 24, 2009); doi:10.1117/12.816590
Text Size: A A A
From Conference Volume 7272

  • Metrology, Inspection, and Process Control for Microlithography XXIII
  • John A. Allgair; Christopher J. Raymond
  • San Jose, California, USA | February 22, 2009

abstract

The extension of optical lithography to 32nm and beyond is made possible by Double Patterning Techniques (DPT) at critical levels of the process flow. The ease of DPT implementation is hindered by increased significance of critical dimension uniformity and overlay errors. Diffraction-based overlay (DBO) has shown to be an effective metrology solution for accurate determination of the overlay errors associated with double patterning [1, 2] processes. In this paper we will report its use in litho-freeze-litho-etch (LFLE) and spacer double patterning technology (SDPT), which are pitch splitting solutions that reduce the significance of overlay errors. Since the control of overlay between various mask/level combinations is critical for fabrication, precise and accurate assessment of errors by advanced metrology techniques such as spectroscopic diffraction based overlay (DBO) and traditional image-based overlay (IBO) using advanced target designs will be reported. A comparison between DBO, IBO and CD-SEM measurements will be reported. . A discussion of TMU requirements for 32nm technology and TMU performance data of LFLE and SDPT targets by different overlay approaches will be presented.

© (2009) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Prasad Dasari ; Rahul Korlahalli ; Jie Li ; Nigel Smith ; Oleg Kritsun, et al.
"Diffraction-based overlay metrology for double patterning technologies", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 727212 (March 24, 2009); doi:10.1117/12.816590; http://dx.doi.org/10.1117/12.816590


Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).

Figures

Tables

NOTE:
Citing articles are presented as examples only. In non-demo SCM6 implementation, integration with CrossRef’s "Cited By" API will populate this tab (http://www.crossref.org/citedby.html).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.