Full Content is available to subscribers

Subscribe/Learn More  >
Proceedings Article

Fundamental study of optical threshold layer approach towards double exposure lithography

[+] Author Affiliations
Xinyu Gu, Adam J. Berro, Younjin Cho, Kane Jen, Saul Lee, Tomoki Ngai, Toshiyuki Ogata, William J. Durand, C. G. Willson

The Univ. of Texas at Austin (USA)

Arunkumar Sundaresan, Jeffrey R. Lancaster, Steffen Jockusch, Nicholas J. Turro

Columbia Univ. (USA)

Paul Zimmerman

Intel Corp. assignee to SEMATECH Inc. (USA)

Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, 72731C (April 01, 2009); doi:10.1117/12.814298
Text Size: A A A
From Conference Volume 7273

  • Advances in Resist Materials and Processing Technology XXVI
  • Clifford L. Henderson
  • San Jose, California, USA | February 22, 2009

abstract

193 immersion lithography has reached its maximal achievable resolution. There are mainly two lithographic strategies that will enable continued increase in resolution. Those are being pursued in parallel. The first is extreme ultraviolet (EUV) lithography and the second is double patterning (exposure) lithography. EUV lithography is counted on to be available in 2013 time frame for 22 nm node. Unfortunately, this technology has suffered several delays due to fundamental problems with source power, mask infrastructure, metrology and overall reliability. The implementation of EUV lithography in the next five years is unlikely due to economic factors. Double patterning lithography (DPL) is a technology that has been implemented by the industry and has already shown the proof of concept for the 22nm node. This technique while expensive is the only current path forward for scaling with no fundamental showstoppers for the 32nm and 22nm nodes. Double exposure lithography (DEL) is being proposed as a cost mitigating approach to advanced lithography. Compared to DPL, DEL offers advantages in overlay and process time, thus reducing the cost-of-ownership (CoO). However, DEL requires new materials that have a non-linear photoresponse. So far, several approaches were proposed for double exposure lithography, from which Optical Threshold Layer (OTL) was found to give the best lithography performance according to the results of the simulation. This paper details the principle of the OTL approach. A photochromic polymer was designed and synthesized. The feasibility of the material for application of DEL was explored by a series of evaluations.

© (2009) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Xinyu Gu ; Adam J. Berro ; Younjin Cho ; Kane Jen ; Saul Lee, et al.
"Fundamental study of optical threshold layer approach towards double exposure lithography", Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, 72731C (April 01, 2009); doi:10.1117/12.814298; http://dx.doi.org/10.1117/12.814298


Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).

Figures

Tables

NOTE:
Citing articles are presented as examples only. In non-demo SCM6 implementation, integration with CrossRef’s "Cited By" API will populate this tab (http://www.crossref.org/citedby.html).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Journal Articles

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.