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Deep ultraviolet (DUV) lithography improvements have been focused on two paths:
further increases in the effective numerical aperture (NA) beyond 1.3, and double
patterning (DP). High-index solutions for increasing the effective NA have not gained
significant momentum due to several technical factors, and have been eclipsed by an
aggressive push to make DP a high-volume manufacturing solution. The challenge is to
develop a cost-effective solution using a process that effectively doubles the lithography
steps required for critical layers, while achieving a higher degree of overlay performance.
As a result, the light source requirements for DP fall into 3 main categories: (a) higher
power to enable higher throughput on the scanner, (b) lower operating costs to offset the
increased number of process steps, and (c) high stability of optical parameters to support
more stringent process requirements. The XLR 600i (6kHz, 90W @15mJ) was
introduced last year to enable DP by leveraging the higher performance and lower
operating costs of the ring architecture XLR 500i (6kHz, 60W @10mJ) platform
currently used for 45nm immersion lithography in production around the world. In
February 2009, the XLR 600ix was introduced as a 60/90W switchable product to
provide flexibility in the transition to higher power requirements as scanner capabilities
are enhanced. The XLR 600ix includes improved optics materials to meet reliability
requirements while operating at higher internal fluences. In this paper we will illustrate
the performance characteristics during extended testing. Examples of performance
include polarization stability, divergence and pointing stability, which enable consistent
pupil fill under extreme illumination conditions, as well as overall thermal stability which
maintains constant beam performance under large changes in laser operating modes.
Furthermore, the unique beam uniformity characteristics that the ring architecture
generates result in lower peak energy densities that are comparable to those of a typical
60W excimer laser. In combination with the XLR's long pulse duration, this allows for
long life scanner optics while operating at 15mJ.
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