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Proceedings Article

Multilayer growth in the APS rotary deposition system

[+] Author Affiliations
Ray Conley, Chian Liu, Cameron M. Kewish, Albert T. Macrander

Argonne National Lab.

Christian Morawe

European Synchrotron Radiation Facility (France)

Proc. SPIE 6705, Advances in X-Ray/EUV Optics and Components II, 670505 (September 20, 2007); doi:10.1117/12.736024
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From Conference Volume 6705

  • Advances in X-Ray/EUV Optics and Components II
  • Ali M. Khounsary; Christian Morawe; Shunji Goto
  • San Diego, CA | August 26, 2007

abstract

We report our progress in the growth of periodic and depth-graded multilayers in the APS rotary deposition system, a machine designed for fabrication of films tens of microns thick with thousands of layers. A computational method was employed to design depth-graded multilayers for use as wide-angular bandpass reflective optics. We present experimental results for a 154-layer WSi2/Si multilayer system with bilayer thickness ranging from 2.2 nm to 5.5 nm that closely match theoretical flat-top reflectivity predictions of 9.8% from 15.6 mrad to 23.3 mrad at 8 keV.

© (2007) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Ray Conley ; Chian Liu ; Cameron M. Kewish ; Albert T. Macrander and Christian Morawe
"Multilayer growth in the APS rotary deposition system", Proc. SPIE 6705, Advances in X-Ray/EUV Optics and Components II, 670505 (September 20, 2007); doi:10.1117/12.736024; http://dx.doi.org/10.1117/12.736024


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