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Proceedings Article

Influence of process conditions on the optical properties HfO2/SiO2 thin films for high power laser coatings

[+] Author Affiliations
B. Langdon, D. Patel, E. Krous, J. J. Rocca, C. S. Menoni, S. Kholi, P. R. McCurdy

Colorado State Univ.

F. Tomasel

Advanced Energy Inc. and Colorado State Univ.

Peter Langston, Albert Ogloza

Naval Air Warfare Ctr.

Proc. SPIE 6720, Laser-Induced Damage in Optical Materials: 2007, 67200X (December 20, 2007); doi:10.1117/12.753027
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From Conference Volume 6720

  • Laser-Induced Damage in Optical Materials: 2007
  • Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; Detlev Ristau; M. J. Soileau; Christopher J. Stolz
  • Boulder, CO | September 24, 2007

abstract

We investigate the variations that occur with changes in the number of layers and with the use of the assist beam main and assist beam energy on the morphology of HfO2/SiO2 quarter wave stacks deposited by dual ion beam sputtering. We show how the addition of sequential HfO2/SiO2 bilayers, up to eight, affects the surface roughness and micro-crystallinity of the top HfO2 layer. We also show that use of the assist source significantly smooths the surface while simultaneously reducing microcrystallinity. The HfO2/SiO2 structures are very robust and can withstand fluences in excess of 3 J/cm2 generated by 1ps pulses from a chirped amplified Ti:Sapphire laser.

© (2007) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

B. Langdon ; D. Patel ; E. Krous ; J. J. Rocca ; C. S. Menoni, et al.
"Influence of process conditions on the optical properties HfO2/SiO2 thin films for high power laser coatings", Proc. SPIE 6720, Laser-Induced Damage in Optical Materials: 2007, 67200X (December 20, 2007); doi:10.1117/12.753027; http://dx.doi.org/10.1117/12.753027


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