Mask-less lithography for fabrication of optical waveguides

M. Dubov; S. R. Natarajan; J. A. R. Williams; I. Bennion

doi:10.1117/12.762594

15 February 2008 Mask-less lithography for fabrication of optical waveguides

M. Dubov, S. R. Natarajan, J. A. R. Williams, I. Bennion

Proceedings Volume 6881, Commercial and Biomedical Applications of Ultrafast Lasers VIII; 688110 (2008) https://doi.org/10.1117/12.762594
Event: Lasers and Applications in Science and Engineering, 2008, San Jose, California, United States

Abstract

A flexible method for fabricating shallow optical waveguides by using femtosecond laser writing of patterns on a metal coated glass substrate followed by ion-exchange is described. This overcomes the drawbacks of low index contrast and high induced stress in waveguides directly written using low-repetition rate ultrafast laser systems. When compared to conventional lithography, the technique is simpler and has advantages in terms of flexibility in the types of structures which can be fabricated.

Citation Download Citation

M. Dubov, S. R. Natarajan, J. A. R. Williams, and I. Bennion "Mask-less lithography for fabrication of optical waveguides", Proc. SPIE 6881, Commercial and Biomedical Applications of Ultrafast Lasers VIII, 688110 (15 February 2008); https://doi.org/10.1117/12.762594

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