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Proceedings Article

New approach for antireflective fused silica surfaces by statistical nanostructures

[+] Author Affiliations
M. Schulze, H.-J. Fuchs, E.-B. Kley, A. Tünnermann

Friedrich-Schiller-Univ. Jena (Germany)

Proc. SPIE 6883, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics, 68830N (February 06, 2008); doi:10.1117/12.767778
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From Conference Volume 6883

  • Advanced Fabrication Technologies for Micro/Nano Optics and Photonics
  • Thomas J. Suleski; Winston V. Schoenfeld; Jian J. Wang
  • San Jose, CA | January 19, 2008

abstract

In this work we present a new technique in order to create antireflective surfaces with the help of statistical nanostructures on fused silica. A specific plasma etching process was found to serve this purpose, as thereby nanostructures are created through self-masking. Under specific etching conditions the micro-contaminations create pillars on the surface with dimensions down to 20 nm, which act as an antireflective nanostructure. Those structures raise the transmission of fused silica in the wavelength range from 370 nm to 500 nm to more than 99.5% (both sides etched). Within the close UV range (from 200 nm up to 400 nm) the transmission can be raised by 4.8% to 97.1% on average.

© (2008) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

M. Schulze ; H.-J. Fuchs ; E.-B. Kley and A. Tünnermann
"New approach for antireflective fused silica surfaces by statistical nanostructures", Proc. SPIE 6883, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics, 68830N (February 06, 2008); doi:10.1117/12.767778; http://dx.doi.org/10.1117/12.767778


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