GaN Schottky barrier and metal-semiconductor-metal photodetectors with in situ SiNx nano-network

J. Xie; J. Mateo; Ü. Özgür; H. Morkoç

doi:10.1117/12.764245

15 February 2008 GaN Schottky barrier and metal-semiconductor-metal photodetectors with in situ SiNx nano-network

J. Xie, J. Mateo, Ü. Özgür, H. Morkoç

Proceedings Volume 6894, Gallium Nitride Materials and Devices III; 68941S (2008) https://doi.org/10.1117/12.764245
Event: Integrated Optoelectronic Devices 2008, 2008, San Jose, California, United States

Abstract

In this paper, we investigated Schottky and metal-semiconductor-metal (MSM) photodetector structures fabricated on GaN templates with in situ SiN_x nanonetwork, which were shown to reduce the dislocation densities significantly in the overgrown material. The GaN layers were grown by metalorganic chemical vapor deposition. The peak responsivity of the Schottky photodetectors on templates with SiN_x nanonetwork was measured to be 0.16 A/W, significantly larger than that for the control samples (0.09 A/W). The MSM photodetectors on templates with SiNx nanonetwork also showed significantly enhanced photoresponsivity (100 A/W) when compared to the control sample without any SiNx (30 A/W) and photoconductive gain. The improvement in the photoresponsivity in both Schottky and MSM photodetector structures with the use of SiN_x nanonetwork is due to the reduction of dislocation densities.

Citation Download Citation

J. Xie, J. Mateo, Ü. Özgür, and H. Morkoç "GaN Schottky barrier and metal-semiconductor-metal photodetectors with in situ SiNx nano-network", Proc. SPIE 6894, Gallium Nitride Materials and Devices III, 68941S (15 February 2008); https://doi.org/10.1117/12.764245

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