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Proceedings Article

Process flow innovations for photonic device integration in CMOS

[+] Author Affiliations
Mark Beals, J. Michel, J. F. Liu, D. H. Ahn, D. Sparacin, R. Sun, C. Y. Hong, L. C. Kimerling

Massachusetts Institute of Technology

A. Pomerene, D. Carothers, J. Beattie

BAE Systems

A. Kopa, A. Apsel

Cornell Univ.

M. S. Rasras, D. M. Gill, S. S. Patel, K. Y. Tu, Y. K. Chen, A. E. White

Lucent Technologies Bell Labs.

Proc. SPIE 6898, Silicon Photonics III, 689804 (February 13, 2008); doi:10.1117/12.774576
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From Conference Volume 6898

  • Silicon Photonics III
  • Joel A. Kubby; Graham T. Reed
  • San Jose, CA | January 19, 2008

abstract

Multilevel thin film processing, global planarization and advanced photolithography enables the ability to integrate complimentary materials and process sequences required for high index contrast photonic components all within a single CMOS process flow. Developing high performance photonic components that can be integrated with electronic circuits at a high level of functionality in silicon CMOS is one of the basic objectives of the EPIC program sponsored by the Microsystems Technology Office (MTO) of DARPA. Our research team consisting of members from: BAE Systems, Alcatel-Lucent, Massachusetts Institute of Technology, Cornell University and Applied Wave Research reports on the latest developments of the technology to fabricate an application specific, electronic-photonic integrated circuit (AS_EPIC). Now in its second phase of the EPIC program, the team has designed, developed and integrated fourth order optical tunable filters, both silicon ring resonator and germanium electro-absorption modulators and germanium pin diode photodetectors using silicon waveguides within a full 150nm CMOS process flow for a broadband RF channelizer application. This presentation will review the latest advances of the passive and active photonic devices developed and the processes used for monolithic integration with CMOS processing. Examples include multilevel waveguides for optical interconnect and germanium epitaxy for active photonic devices such as p-i-n photodiodes and modulators.

© (2008) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Mark Beals ; J. Michel ; J. F. Liu ; D. H. Ahn ; D. Sparacin, et al.
"Process flow innovations for photonic device integration in CMOS", Proc. SPIE 6898, Silicon Photonics III, 689804 (February 13, 2008); doi:10.1117/12.774576; http://dx.doi.org/10.1117/12.774576


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