Fabrication of EUV components with MRF

Paul E. Murphy; James T. Mooney; Thomas P. Courtney

doi:10.1117/12.506274

13 January 2004 Fabrication of EUV components with MRF

Paul E. Murphy, James T. Mooney, Thomas P. Courtney

Proceedings Volume 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications; (2004) https://doi.org/10.1117/12.506274
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

Magneto-rheological finishing (MRF) is a deterministic figuring process capable of quickly achieving extreme surface accuracies. The commercially available Q22 has been instrumental in the manufacture of DUV lithography optics to better than 30 nm P-V figure and 1.0 nm rms microroughness. The requirements for EUV optics, photomask substrates, and silicon-on-insulator (SOI) wafers, however, have taken "extreme accuracy" to new levels. Surface quality is specified over a broad range of spatial frequencies, and allowable error magnitudes shrink ever smaller. These specifications expose some limitations of sub-aperture tool technologies. MRF capabilities, recent developments, and future system improvements that address these concerns are described. We present polishing results on photomasks that pass flatness requirements until year 2010. We further demonstrate extreme precision figure correction capability on SOI wafers, achieving thickness uniformity of better than 2 nm PV and 0.3 nm rms.

Citation Download Citation

Paul E. Murphy, James T. Mooney, and Thomas P. Courtney "Fabrication of EUV components with MRF", Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, (13 January 2004); https://doi.org/10.1117/12.506274

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