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Proceedings Article

High-performance multilayer coatings for EUV lithography

[+] Author Affiliations
Eberhard Spiller

Spiller X-Ray Optics (USA)

Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, 89 (January 13, 2004); doi:10.1117/12.507237
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From Conference Volume 5193

  • Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications
  • Ali M. Khounsary; Udo Dinger; Kazuya Ota
  • San Diego, California, USA | August 03, 2003

abstract

We review the specification for the coatings in steppers for extreme ultraviolet (EUV) lithography and discuss the deposition methods that have produced such coatings. Thermal deposition by electron beam, magnetron sputtering, and ion beam deposition have all been able to achieve the requirements for future EUV optics. Ion beam sputtering has produced coatings with very few defects and can smooth substrate roughness and mitigate the effects of substrate defects.

© (2004) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Eberhard Spiller
"High-performance multilayer coatings for EUV lithography", Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, 89 (January 13, 2004); doi:10.1117/12.507237; http://dx.doi.org/10.1117/12.507237


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