Mask 3D effects: impact on imaging and placement

Jo Finders; Thijs Hollink

doi:10.1117/12.896909

1 April 2011 Mask 3D effects: impact on imaging and placement

Jo Finders, Thijs Hollink

Proceedings Volume 7985, 27th European Mask and Lithography Conference; 79850I (2011) https://doi.org/10.1117/12.896909
Event: 27th European Mask and Lithography Conference, 2011, Dresden, Germany

Abstract

In this paper we perform a fundamental study on the impact of mask absorber in ArF immersions lithography: the mask 3D effects. From simulations and analysis of diffraction coefficients we could identify a range of relevant features and imaging and placement phenomena. For these features, experimental results were obtained to pinpoint the mask 3D effects. We will demonstrate how to model and understand the mask 3D effects and give solutions to counteract the mask 3D effects.

Citation Download Citation

Jo Finders and Thijs Hollink "Mask 3D effects: impact on imaging and placement", Proc. SPIE 7985, 27th European Mask and Lithography Conference, 79850I (1 April 2011); https://doi.org/10.1117/12.896909

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