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Proceedings Article

Fabrication and test of nano crossbar switches/MOSFET hybrid circuits by imprinting lithography

[+] Author Affiliations
Zhiyong Li, Xuema Li, Douglas A. A. Ohlberg, Joseph Straznicky, Wei Wu, Zhaoning Yu, Julien Borghetti, Duncan Stewart, R. Stanley Williams

Hewlett-Packard Labs.

William Tong

Hewlett-Packard Co.

Proc. SPIE 6921, Emerging Lithographic Technologies XII, 692108 (March 14, 2008); doi:10.1117/12.774144
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From Conference Volume 6921

  • Emerging Lithographic Technologies XII
  • Frank M. Schellenberg
  • San Jose, California, USA | February 24, 2008

abstract

An integrated circuit combining imprinted, nanoscale crossbar switches with metal-oxide field effect transistors (MOSFET) was fabricated and tested. Construction of the circuits began with fabrication of n-channel MOSFET devices on silicon-on-insulator (SOI) substrates using CMOS compatible process techniques. To protect the FET devices as well as provide a flat surface for subsequent nanoimprint lithography, passivation and planarization layers were deposited. Crossbar junctions were then fabricated next to the FETs using imprint lithography to first define arrays of parallel nanowires over which, a switchable material layer was deposited. This was followed by a second imprint proces to construct another set of parallel wires on top of, and orthogonal to the first, to complete the nano-crossbar array with a half pitch (hp) of 50 nm. The switchable crossbar devices were then connected to the gate of the FETs and the resulting integrated circuit was tested using the FET as the output signal follower. This successful fabrication process serves as a proof-of-principle demonstration and a platform for advanced CMOS/nanoscale crossbar hybrid logic circuits.

© (2008) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Zhiyong Li ; Xuema Li ; Douglas A. A. Ohlberg ; Joseph Straznicky ; Wei Wu, et al.
"Fabrication and test of nano crossbar switches/MOSFET hybrid circuits by imprinting lithography", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 692108 (March 14, 2008); doi:10.1117/12.774144; http://dx.doi.org/10.1117/12.774144


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