0

Full Content is available to subscribers

Subscribe/Learn More  >
Proceedings Article

LPP EUV light source employing high power C02 laser

[+] Author Affiliations
Hideo Hoshino, Takashi Suganuma, Takeshi Asayama, Krzysztof Nowak, Tamotsu Abe, Akira Endo, Akira Sumitani, Masato Moriya

Extreme Ultraviolet Lithography System Development Association (Japan)

Proc. SPIE 6921, Emerging Lithographic Technologies XII, 692131 (March 21, 2008); doi:10.1117/12.771847
Text Size: A A A
From Conference Volume 6921

  • Emerging Lithographic Technologies XII
  • Frank M. Schellenberg
  • San Jose, California, USA | February 24, 2008

abstract

We are developing a high power CO2 laser system for a LPP EUV light source. Recent theoretical and experimental data demonstrate the advantages of the combination of a CO2 laser with a Sn target including the generation of a high CE and low debris plasma with low energy ions and low out-of-band radiation. Our laser system is a short pulse CO2 MOPA (Master Oscillator Power Amplifier) system with 22 ns pulse width and multi kW average power at 100 kHz repetition rate. We achieved an average laser power of 8 kW with a single laser beam having very good beam quality. A EUV in-band power of 60 W at the intermediate focus was generated irradiating a rotating tin plate with 6 kW laser power.

© (2008) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Hideo Hoshino ; Takashi Suganuma ; Takeshi Asayama ; Krzysztof Nowak ; Tamotsu Abe, et al.
"LPP EUV light source employing high power C02 laser", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 692131 (March 21, 2008); doi:10.1117/12.771847; http://dx.doi.org/10.1117/12.771847


Access This Article
Sign In to Access Full Content
Please Wait... Processing your request... Please Wait.
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
 

Figures

Tables

NOTE:
Citing articles are presented as examples only. In non-demo SCM6 implementation, integration with CrossRef’s "Cited By" API will populate this tab (http://www.crossref.org/citedby.html).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement


Buy this article ($18 for members, $25 for non-members).
Sign In